Structural Characterization of ZnO Thin Films Deposited onto Silicon Substrates using Cathodic Magnetron Sputtering
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Abstract
In this study, we analyzed Zinc Oxide (ZnO) thin films deposited on silicon substrates using magnetron sputtering. These films have numerous applications in photovoltaic and optoelectronic devices due to their excellent physique properties. We used two structural characterization techniques: X-ray diffraction and scanning electron microscopy. We found that the ZnO films had good crystallinity and a columnar structure on the substrate surface, as indicated by the (002) orientation. These findings could potentially be useful for the development of ZnO-based devices such as solar cells and piezoelectric sensors. our results are consistent with those found by other researchers.
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